Consumables for vacuum coating and thin-film deposition
We deliver rotatable, tubular sputtering targets up to 4,000 mm length, planar sputtering targets up to 4,000 mm length or up to 800 mm diameter. Bonding service is offered on request for all kind of sputtering targets.
Tubular sputtering targets for the large area deposition: ITO, Mo, Al, Si ...Sputtering targets for thin-film solar cells: Cu, In, Ga, Si, AZO ...Sputtering targets for optical coatings: SiO2, TiO2 ...Target materials for semiconductors: Cu, Si, SiO2 ...
Use our vacuum coating know-how and our production capacity
With our in-house PVD coating equipment we are able to offer sample coatings as well as coating services for small batch productions.
Sputter deposition by means of inline type systems: substrates up to 600 x 400 mmPVD and PECVD coatings by means of cluster type systems: up to 200 mm diameterSputter deposition on foil or web substrates: up to 300 mm width